Home About Us Mission and Vision Technologies Technology Transfer Ongoing Major Projects Newsletter Staff Details Contact Us	Low energy broad beam ion source. Low Energy Broad Beam Ion sources are widely used in process industries for surface cleaning, etching, thin film growth and nanopatterning. Ion sources are also used as plasma thrusters in satellites and good for fundamental studies of ion beam physics. But often the ion sources are not very cost effective and simple to use.
Advantages of Low Energy Broad Beam Ion sources Easy to fabricate and require low cost materials. Easy maintenance. Require low cost DC power supplies for operation. Require low vacuum conditions. Gridless broad beam. To monitor the plume divergence and ion energies plasma diagnostics is also developed. Applications Surface cleaning by etching. Surface nanopatterning. Thin film growth by sputtering. Wide beam plume for fundamental studies.

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Low energy broad beam ion source.

Low Energy Broad Beam Ion sources are widely used in process industries for surface cleaning, etching, thin film growth and nanopatterning. Ion sources are also used as plasma thrusters in satellites and good for fundamental studies of ion beam physics. But often the ion sources are not very cost effective and simple to use.

Advantages of Low Energy Broad Beam Ion sources

Easy to fabricate and require low cost materials.
Easy maintenance.
Require low cost DC power supplies for operation.
Require low vacuum conditions.
Gridless broad beam.
To monitor the plume divergence and ion energies plasma diagnostics is also developed.

Applications

Surface cleaning by etching.
Surface nanopatterning.
Thin film growth by sputtering.
Wide beam plume for fundamental studies.

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Home About Us Mission and Vision Technologies Technology Transfer Ongoing Major Projects Newsletter Staff Details Contact Us

Home
About Us
Mission and Vision
Technologies
Technology Transfer
Ongoing Major Projects
Newsletter
Staff Details
Contact Us